Aluminum alloy anodizing, as an electrochemical reaction process, demonstrates a perfect combination of decoration and durability for semiconductor metals. In this process, the metal or alloy serves as the anode and reacts with ions in the electrolyte und
Time：2025-10-29
Electropolishing and passivation treatment, acting as a powerful duo for enhancing semiconductor metal surface performance, play an indispensable role in semiconductor manufacturing. Electropolishing achieves smooth and bright surface treatment of workpie
Time：2025-10-29
Chemical cleaning and polishing, as the precision art of semiconductor surface treatment, jointly ensure the high quality and reliability of semiconductor devices. Chemical cleaning achieves the purposes of oil removal, rust removal, scale removal, and de
Time：2025-10-29
Ultrasonic cleaning technology, as an advanced surface treatment method, has demonstrated efficient practice in removing particles in semiconductor manufacturing. This technology utilizes the cavitation effect, acceleration effect, and straight-flow effec
Time：2025-10-29
As an efficient surface treatment technology, the sandblasting process demonstrates its unique application value in the treatment of semiconductor components. This process utilizes high-speed ejected sand particles to impact the surface of workpieces, cre
Time：2025-10-29
In the highly sophisticated field of semiconductor manufacturing, surface treatment processes occupy a pivotal and core position. The manufacturing precision requirements for semiconductor devices reach the nanometer level. Any minor surface defects, such
Time：2025-10-29
Metal surface treatment is a foundational technology in manufacturing, with its objectives expanding from traditional corrosion and wear resistance to high-end applications such as enhancing optical, electrical, and biocompatible properties. With the expl
Time：2025-09-23
In the precision-driven world of semiconductor manufacturing, the Showerhead (also known as a gas distribution plate or spray head) serves as the core component of gas distribution systems. Its performance directly determines the uniformity of thin-film d
Time：2025-09-23
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