Role of Showerhead in Gas Distribution SystemsIn semiconductor manufacturing, the gas distribution system is a critical component for ensuring process stability and product quality. The Showerhead, as the core element of this system, directly impacts gas
Time：2025-08-28
Showerhead: The Unsung Hero Behind Semiconductor FabricationIn the high-tech realm of semiconductor manufacturing, the Showerhead serves as a critical component of gas distribution systems. While it does not directly participate in wafer processing, its p
Time：2025-08-28
Technological Innovation Leading the Development of Metal ShowerheadsAs the core component of gas distribution systems in semiconductor fabrication, advancements in Showerhead technology directly impact process efficiency and yield. Recent breakthroughs i
Time：2025-08-28
IntroductionIn the highly precise and technology-intensive field of semiconductor manufacturing, every component plays a critical role. The Showerhead, particularly as a core part of gas distribution plates and uniform gas flow panels, directly impacts pr
Time：2025-08-28
Dry etching, as a core technology in the field of micro- and nano-fabrication, is widely applied in integrated circuit (IC) manufacturing and micro-electro-mechanical systems (MEMS) due to its advantages of high precision and anisotropy. Its fundamental p
Time：2025-08-28
I. Micropore Laser Machining: Precision Revolution Driving Process Advancement1.1 Core Functions and Technical ChallengesMetal showerheads enable uniform gas injection through tens of thousands of micropores (diameter: 10–200 μm), with machining precisio…
Time：2025-08-12
I. Core Functions and Technical ChallengesMetal showerheads enable uniform gas injection through tens of thousands of microholes (diameter: 10–200 μm), with machining precision directly impacting film deposition thickness uniformity (≤3% for acceptable …
Time：2025-08-12
In semiconductor thin-film deposition equipment, metal showerheads must simultaneously meet three critical requirements: high-temperature resistance, plasma corrosion resistance, and uniform gas distribution. Material selection for these components requir
Time：2025-08-12
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